Our Vacuum Deposition Division is dedicated to developing and applying thin-film technologies based on PVD (Physical Vapor Deposition), CVD (Chemical Vapor Deposition), and advanced hybrid processes. These techniques enable the fabrication of functional coatings with customized optical, electrical, and mechanical properties for research, industrial, and defense applications.
Process Control: Real-time monitoring of deposition rate, thickness, and substrate temperature.
Material Range: Metals (Al, Cr, Ti, Au), oxides (SiO₂, TiO₂), nitrides (TiN, AlTiN), carbides, and DLC films.
Applications
Optical coatings: AR (anti-reflective), HR (high-reflective), and filter layers for lenses and sensors.
Protective & Functional coatings: DLC, ITO, conductive, or corrosion-resistant surfaces.
Microelectronics: Metallization, barrier layers, and MEMS sensor fabrication.
Industrial & Aerospace: Wear-resistant and high-hardness coatings for mechanical components.
R&D and Innovation
Our R&D team continuously optimizes vacuum deposition parameters and layer architectures to achieve enhanced adhesion, uniformity, and functional performance. The integration with microfabrication and lithography lines allows the realization of complex multilayer systems for high-end optical, photonic, and sensing devices.